March 22, 2011 9:00 - 17:00
Empa, Dübendorf, Room MO 235
Next-generation lithography using focused electron and ion beams relies on electron-triggered reactions with adsorbed molecules introduced into the microscope chamber. It is a three-dimensional, maskless, nanoscale, and minimally-invasive concept of lithography, which can be applied to planar as well as to delicate pre-structured surfaces. Injecting functional molecules into a scanning electron microscope (SEM) opens exciting new ways to fabricate novel materials in order to prototype, repair, or trim micro- and nanodevices in an in situ, one-step manner.