Online Archiv

March 22, 2011 9:00 - 17:00

Empa, Dübendorf, Room MO 235

The course is structured to appeal to R&D managers and R&D scientists and engineers from industry and academic institutes involved in the development, prototyping, and analysis of micro- and nanodevices.

Speakers

Dr. Ivo Utke, Empa

The course is structured to appeal to R&D managers and R&D scientists and engineers from industry and academic institutes involved in the development, prototyping, and analysis of micro- and nanodevices.

Empa / FSRM

Information

see box top right

Content

Objectives
Next-generation lithography using focused electron and ion beams relies on electron-triggered reactions with adsorbed molecules introduced into the microscope chamber. It is a three-dimensional, maskless, nanoscale, and minimally-invasive concept of lithography, which can be applied to planar as well as to delicate pre-structured surfaces. Injecting functional molecules into a scanning electron microscope (SEM) opens exciting new ways to fabricate novel materials in order to prototype, repair, or trim micro- and nanodevices in an in situ, one-step manner.